Room-Temperature Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane with Hard Poly(dimethylsiloxane) Mold

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概要

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• A new room-temperature imprinting method was developed using liquid-phase hydrogen silsesquioxane (HSQ) with a hard poly(dimethylsiloxane) (h-PDMS) mold. The simultaneous imprinting of arbitrary patterns including both submicron and greater than 100 μm patterns on a 4-in. wafer were replicated at room-temperature and a low pressure with high throughput, because the solvent in HSQ gradually evaporated through the pores of the h-PDMS mold. A bilayer structure was successfully fabricated using as HSQ pattern as an etching mask without removing the residual layer.

• 2010-06-25

著者

• Kazuhiro Kanda

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Kang Yuji

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Okada Makoto

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Minari Chiaki

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Yuichi Haruyama

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Shinji Matsui

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Makoto Okada

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Yuji Kang

  LASTI, Graduate School of Science, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

関連論文

• Room-Temperature Nanoimprinting Using Liquid-Phase Hydrogen Silsesquioxane with Hard Poly(dimethylsiloxane) Mold
• Characteristics of Antisticking Layer Formed by CHF3 Plasma Irradiation for Nanoimprint Molds

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