Robust Control Design for Vibration Isolation of an Electron Beam Projection Lithography System
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概要
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This paper describes vibration control for an electron beam projection lithography (EPL) system. Two kinds of disturbances should be considered for an EPL: load disturbances from the machine and ground disturbances from the environment. However, the suspension settings for insulating these two disturbances conflict with each other. Therefore, we propose a double-layer optical table and apply disturbance response decomposing (DRD) techniques to independently control the disturbances. We use a passive control structure to isolate the ground disturbances, and an active control structure to suppress load disturbances. In addition, symmetric transformation is applied to decouple a full optical table into bounce/pitch and roll/warp half-table models, which can be further decoupled into quarter-table models to simplify controller design. Finally, we apply robust control techniques to design active controllers. From both simulation and experimental results, the designed $H_{\infty}$ robust controllers are proven effective in reducing EPL system vibrations.
- 2010-06-25
著者
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Fu-Cheng Wang
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.
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Min-Feng Hong
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.
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Wang Fu-Cheng
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.
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Hong Min-Feng
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.
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Yen Jia-Yush
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.
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Jia-Yush Yen
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan, R.O.C.