Physical and Electrical Properties of SiO2 Layer Synthesized by Eco-Friendly Method
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概要
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SiO2 thin film has a wide range of applications, including insulation layers in microelectronic devices, such as semiconductors and flat panel displays, due to its advantageous characteristics. Herein, we developed a new eco-friendly method for manufacturing SiO2 nanoparticles and, thereby, SiO2 paste to be used in the digital printing process for the fabrication of SiO2 film. By excluding harmful Cl- and NO3- elements from the SiO2 nanoparticle synthetic process, we were able to lower the heat treatment temperature for the SiO2 precursor from 600 to 300 °C and the diameter of the final SiO2 nanoparticles to about 14 nm. The synthesized SiO2 nanoparticles were dispersed in an organic solvent with additives to make a SiO2 paste for feasibility testing. The SiO2 paste was printed onto a glass substrate to test the feasibility of using it for digital printing. The insulation resistance of the printed film was high enough for it to be used as an insulation layer for passivation.
- 2010-05-25
著者
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Hong Sung-jei
Display Components And Materials Research Center Korea Electronics Technology Institute
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Kim Jong-woong
Display Components And Materials Research Center Korea Electronics Technology Institute
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Sung-Jei Hong
Display Research and Development Division, Korea Electronics Technology Institute, #68, Yatap-dong, Bundang-gu, Seongnam, Gyeonggi-do 463-816, Republic of Korea
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Jeong-In Han
Display Research and Development Division, Korea Electronics Technology Institute, #68, Yatap-dong, Bundang-gu, Seongnam, Gyeonggi-do 463-816, Republic of Korea
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Young-Seok Kim
Display Research and Development Division, Korea Electronics Technology Institute, #68, Yatap-dong, Bundang-gu, Seongnam, Gyeonggi-do 463-816, Republic of Korea
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Kim Young-Seok
Display Research and Development Division, Korea Electronics Technology Institute, #68, Yatap-dong, Bundang-gu, Seongnam, Gyeonggi-do 463-816, Republic of Korea
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Tae-Hwan Hong
Department of Materials Science and Engineering, Chungju National University, #72, Daehak-ro, Chungju, Chungbuk 380-702, Republic of Korea
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Jong-Woong Kim
Display Research and Development Division, Korea Electronics Technology Institute, #68, Yatap-dong, Bundang-gu, Seongnam, Gyeonggi-do 463-816, Republic of Korea
関連論文
- Characteristics of Printed Thin Films Using Indium Tin Oxide (ITO) Ink
- Physical and Electrical Properties of SiO2 Layer Synthesized by Eco-Friendly Method
- Characteristics of IndiumTinOxide (ITO) Glass Re-Used from Old TFT-LCD Panel
- Characteristics of Indium-Tin-Oxide (ITO) Glass Re-Used from Old TFT-LCD Panel