Effect of Self-Heating on Time-Dependent Dielectric Breakdown in Ultrathin MgO Magnetic Tunnel Junctions for Spin Torque Transfer Switching Magnetic Random Access Memory
スポンサーリンク
概要
- 論文の詳細を見る
Spin torque transfer switching magnetic random access memory (Spin-MRAM) using MgO-magnetic tunnel junction (MTJ) is considered to be the most promising candidate for high-density, high-speed, and non-volatile RAM. Notwithstanding its excellent potential, the breakdown mechanism of MgO-MTJ has not been well understood although a thorough understanding is essential for commercialization of Spin-MRAM. In this paper, we demonstrate for the first time the modeling of dielectric breakdown phenomena of MgO-MTJ by time-dependent dielectric breakdown (TDDB) measurement concerning the effect of self-heating using simulation and conclude that $E$-model with the effect of self-heating at MgO-MTJ during current stress (power) removed gives the best fitting as a degradation model of MgO-MTJ ultrathin dielectrics.
- 2010-04-25
著者
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Tomomasa Ueda
Corporate Research & Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Keiji Hosotani
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Makoto Nagamine
Corporate Research & Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Hisanori Aikawa
Corporate Research & Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Sumio Ikegawa
Corporate Research & Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Yoshiaki Asao
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Hiroaki Yoda
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Akihiro Nitayama
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Hiroaki Yoda
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Sumio Ikegawa
Corporate Research & Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Hisanori Aikawa
Corporate Research & Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Akihiro Nitayama
Center for Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan