Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist

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概要

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• A transmission measurement system with high accuracy was installed in the BL10 beamline of the NewSUBARU synchrotron facility. We measured the transmittance of a resist using extreme ultraviolet (EUV) light, and evaluated the relation between the E0 sensitivity and the transmittance of the resist under EUV exposure. The measured transmittance was almost the same as the calculated value obtained using from the table of Henke atomic scattering factors. Furthermore, it is confirmed that there is a correlation between the photoabsorption coefficient of the anion of PAG and the E0 sensitivity under EUV exposure at a wavelength of 13.5 nm. Thus, increasing the atomic photoabsorption cross section of the anion of PAG is effective in increasing the sensitivity of the chemically amplified resist in EUVL.

• 2009-06-25

著者

• Fukushima Yasuyuki

  University of Hyogo, 1-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Ohnishi Ryuji

  University of Hyogo, 1-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Watanabe Takeo

  University of Hyogo, 1-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Osugi Masafumi

  University of Hyogo, 1-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

• Kinoshita Hiroo

  University of Hyogo, 1-1-2 Koto, Kamigori, Hyogo 678-1205, Japan

関連論文

• Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography
• Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist
• Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer

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