Fabrication of Single Crystalline (La,Ba)MnO3 Nanodot Array by Mo/SiOx Lift-Off Technique
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概要
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Nanoimprint-lithography-based molybdenum lift-off was applied to fabricate a perovskite-type La0.8Ba0.2MnO3(LBMO) nanodot array on a SrTiO3(100) substrate in combination with an in situ pulsed laser deposition (PLD) technique. We fabricated a Mo/SiOx bilayer mask pattern to prevent the crystallization of the Mo layer even at 700 °C and successfully obtained a LBMO nanodot array with a dot size as small as 200 nm by removing the Mo layer using 0.1 N NaOH aqueous solution.
- 2009-11-25
著者
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Kawai Tomoji
JST-CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
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Suzuki Naoki
JST-CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
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Tanaka Hidekazu
JST-CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan