Outgassing Quantification Analysis of Extreme Ultraviolet Resists

概要

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Extreme ultraviolet (EUV) resist outgassing quantification analysis using the pressure rise method with a modified ideal gas equation is discussed. The use of the outgassing amounts based on the E0 and/or multiples of E0 is recommended as this information may be crucial in understanding the behavior of resist outgassing at various exposure or patterning doses. Furthermore, this method is effective in representing resist outgassing release mechanisms which were found to differ greatly depending on the resist formulation. Applying this method with quadrupole mass spectrometry (QMS), analysis of the resist outgassing obtained from a model poly(hydroxystyrene) (PHS) resist with varied quencher concentrations showed that the decrease and shift of the maximum pressure rise peak of the pressure rise curve as quencher concentration was increased was found to be due to the suppression of photo acid production which, in effect controls the amount of protecting group released as resist outgassing.
2008-06-25