Relationship between Film Deposition Rate and Exhaust Speed in Aliphatic Polyurea Thin Film Prepared by Vapor Deposition Polymerization

概要

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1,12-Diaminododecane (DAD) and 1,3-bis(isocyanatomethyl)cyclohexane (H6XDI) are the raw materials of the aliphatic polyurea that we studied. These materials are prepared by vapor deposition polymerization (VDP). The setting of the temperatures of the chamber, substrate and raw material monomers is important in depositing monomer gas efficiently on the substrate. Generally, films are formed in the VDP equipment, while the conductance valve is released. However, multiple problems related to the trouble of the equipment occur in this method, when the vapor pressure is high, similar to that in the case of an aliphatic group monomer. Thus, we developed a new method of preventing these problems. In this method, the conductance valve is closed to make the exhaust speed zero, and it is also proven that the film deposition rate increases.
2008-02-25