Resist Flow Behavior in Ultraviolet Nanoimprint Lithography as a Function of Contact Angle with Stamp and Substrate

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概要

• 論文の詳細を見る

• This study was performed to investigate dynamic resist filling in ultraviolet nanoimprint lithography. The effects of surface condition on flow behavior during the filling process, including the contact angle and the aspect ratio of recessed features, are presented through numerical simulations. The optimized surface conditions for good imprinting results were determined through numerical experiments covering a range of test conditions. A decrease in the feature aspect ratio of up to 0.5 resulted in a contact angle twice the original value. Complete filling occurred when the contact angle of the vertical side wall was as low as that of the substrate.

• 2008-11-25

著者

• Jeong Jun-ho

  Intelligent And Precision Machinery Research Division Korea Institute Of Machinery And Materials

• Kim Ki-don

  Intelligent And Precision Machinery Research Division Korea Institute Of Machinery And Materials

• Lee Eung-sug

  Intelligence And Precision Machinery Research Division Korea Institute Of Machinery & Materials(

• Lee Eung-sug

  Intelligent and Precision Machinery Research Division, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea

• Kwon Hyo-Joong

  ADP Engineering Co., Ltd., 333-5 Sangdaewon-dong, Joongwon-gu, Seongnam, Gyeonggi-do 462-807, Korea

• Choi Dae-guen

  Intelligent and Precision Machinery Research Division, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea

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• Organic thin-film transistor with printed electrodes by using microcontact and direct printing processes (Silicon devices and materials: 第15回先端半導体デバイスの基礎と応用に関するアジア・太平洋ワークショップ(AWAD2007))
• Nanoimprinting of Thin Polymer Films Using Elementwise Patterned Stamp and Subsequent Application of Pressurized Air
• Resist Flow Behavior in Ultraviolet Nanoimprint Lithography as a Function of Contact Angle with Stamp and Substrate
• Nanoimprinting of Thin Polymer Films Using Elementwise Patterned Stamp and Subsequent Application of Pressurized Air

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