Preparation and Characterization of Multilayer Capacitor with SrTiO3 Thin Films by Aerosol Chemical Vapor Deposition

概要

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The deposition of crystalline and amorphous STO (SrTiO3) thin films by aerosol chemical vapor deposition (ASCVD) was investigated. The crystalline STO thin film exhibited a higher dielectric constant of approximately 160 and a dielectric loss ($\tan\delta$) of 3.5% (at 1 kHz). In contrast, the amorphous STO thin films with dielectric constants of 20–65 showed a smaller dielectric loss below 1% and much lower leakage currents of $10^{-8}$–$10^{-6}$ A/cm2 at up to $\pm 30$ VDC. On the basis of these results, a thin-film multilayer ceramic capacitor (MLCC) with ten amorphous STO dielectric layers and Pt electrodes of 160 and 120 nm thicknesses, respectively, was prepared at a processing temperature of 600 °C, showing a capacitance density of higher than 900 nF/cm2 (effective electrode area: $2\times 2$ mm2), a dielectric loss of 0.1% at 1 kHz and a leakage current of $10^{-7}$ A/cm2 at $\pm 5$ VDC.
2006-09-30