Numerical Analysis of Photoinduced Surface Relief Formed on Azobenzene Polymer Film by Optical Near-Field Exposure
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概要
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The physical model of photoinduced mass transport, which was previously proposed, was improved. A novel numerical method was developed to analyze electromagnetic field distribution and energy transformation in more detail. The electromagnetic field was calculated using a modified cubic interpolated propagation/constrained interpolation profile (CIP) method. The mass transport was calculated using a particle method proposed previously. The photoinduced surface relief of an azobenzene polymer film formed by optical near-field exposure was simulated using a proposed physical model and a numerical method. The numerical results were compared with experimental results. The surface profile and energy dependence of thne photoinduced surface relief formation obtained numerically were coincided with the experimetal results.
- 2006-08-30
著者
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Itoh Masahide
Institute Of Applied Physics And Tsukuba Avuanced Research Alliance University Of Tsukuba
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BARADA Daisuke
Institute of Applied Physics, University of Tsukuba
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FUKUDA Takashi
Special Research Project on Nanoscience, University of Tsukuba
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Yatagai Toyohiko
Institute For Applied Physics University Of Tsukuba
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Barada Daisuke
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
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Yatagai Toyohiko
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
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Fukuda Takashi
Special Research Project on Nanoscience, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
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