Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure

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概要

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• Plasma polymer films of vinyltriethoxysilane were prepared at the same deposition conditions but different film thicknesses and analyzed with respect to deposition rate, surface morphology and selected mechanical properties. The mean deposition rate decreased from 190 to 105 nm min-1 and the RMS roughness increased from 0.1 to 17.5 nm with film thickness ranging from 15.8 nm to 8.4 μm. The RMS roughness correlated to film thickness and the roughening coefficient was 0.92. Depth profiles of the elastic modulus and hardness revealed the gradient character of the films with thickness of up to 0.5 μm and a layered structure of a thicker film. Results enabled the reconstruction of a thicker film (${>}0.5$ μm) as the layered structure, which consists of a gradient interlayer at the substrate, a relatively homogeneous layer as the bulk, and gradient overlayer at the film surface.

• 2006-10-30

著者

• Drzal Lawrence

  Composite Materials And Structures Center Michigan State University

• CECH Vladimir

  Institute of Materials Chemistry, Brno University of Technology

• XU Lanhong

  Composite Materials and Structures Center, Michigan State University

• VANEK Jan

  Institute of Materials Chemistry, Brno University of Technology

• Drzal Lawrence

  Composite Materials and Structures Center, Michigan State University, 2100 Engineering Building, MI 48824-1226, U.S.A.

• Vanek Jan

  Institute of Materials Chemistry, Brno University of Technology, Purkynova 118, CZ-612 00 Brno, Czech Republic

• Cech Vladimir

  Institute of Materials Chemistry, Brno University of Technology, Purkynova 118, CZ-612 00 Brno, Czech Republic

関連論文

• Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure
• Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure

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