Tool-Induced Shift and Pupil Transmittance Distribution in Measurement Optics
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概要
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To advance large scale integrated circuit (LSI), alignment optics of an exposure system must be highly accurate. To satisfy this requirement, amplitude error in the optics is studied and analyzed. The factor in amplitude error that causes measurement errors is the asymmetrical brightness distribution in numerical aperture (NA) of the beam at the detector surface. A method that measures the amplitude error and phase error separately is presented. The measurement errors caused by amplitude error are studied. For the pattern that is needed for progress on LSI, these errors tend to be large. In order to minimize these errors, our alignment technique is studied. We demonstrate that focus optimization of a field image alignment sensor (FIA). FIA focus optimization (FFO) is effective in reducing errors, especially errors dependent on focus, caused by pupil transmittance distribution. The advantages of FFO for future-generation LSI production are confirmed.
- 2005-07-15
著者
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Sugaya Ayako
The Fifth Development Section, Optical R&D Department, Optical Technology Headquarters, Core Technology Center, Nikon Corporation, 6-3 Nishi-Ohi 1-chome, Shinagawa-ku, Tokyo 140-8601, Japan
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Nagayama Tadashi
The Fifth Development Section, Optical R&D Department, Optical Technology Headquarters, Core Technology Center, Nikon Corporation, 6-3 Nishi-Ohi 1-chome, Shinagawa-ku, Tokyo 140-8601, Japan
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Masada Takahiro
The Fifth Development Section, Optical R&D Department, Optical Technology Headquarters, Core Technology Center, Nikon Corporation, 6-3 Nishi-Ohi 1-chome, Shinagawa-ku, Tokyo 140-8601, Japan
関連論文
- Alignment Focus Optimization and Image Contrast
- Tool-Induced Shift and Pupil Transmittance Distribution in Measurement Optics
- Alignment Focus Optimization and Image Contrast