High-Deposition-Rate Dielectric Thin Film for Phase Change Optical Disc
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概要
- 論文の詳細を見る
To improve the productivity of high density digital versatile disk-rewritable media (HD DVD-rewritable media), a silicon-nickel oxynitride (SiNiON) film that can be sputtered with a SiNi target in an atmosphere of mixed argon, oxygen, and nitrogen gases has been developed. The SiNiON film had a deposition rate almost the same as that of the ZnS-SiO2 film widely used in phase change recording media, and its refractive index was sufficiently low, that is, 1.54. Its structure was a mixed matrix of Si, Ni, O, and N, rather than a mixture of SiO2 and Si3N4 clusters. HD DVD-rewritable media using the SiNiON film showed almost the same excellent read/write characteristics as those of the media using the SiO2 film.
- 2005-05-15
著者
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Ide Tatsunori
Media And Information Research Laboratories Nec Corporation
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Ohkubo Shuichi
Media And Information Research Laboratories Nec Corporation
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Ohkubo Shuichi
Media and Information Research Laboratories, NEC Corporation, 1753 Shimonumabe, Nakahara-ku, Kawasaki, Kanagawa 211-8666, Japan
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Kariyada Eiji
Media and Information Research Laboratories, NEC Corporation, 1753 Shimonumabe, Nakahara-ku, Kawasaki, Kanagawa 211-8666, Japan
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Tanabe Hideki
Media and Information Research Laboratories, NEC Corporation, 1753 Shimonumabe, Nakahara-ku, Kawasaki, Kanagawa 211-8666, Japan
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Ide Tatsunori
Media and Information Research Laboratories, NEC Corporation, 1753 Shimonumabe, Nakahara-ku, Kawasaki, Kanagawa 211-8666, Japan
関連論文
- Signal-to-Noise Ratio in a Partial-Response Maximum-Likelihood Detection
- Signal-to-Noise Ratio in a Partial-Response Maximum-Likelihood Detection
- High-Deposition-Rate Dielectric Thin Film for Phase Change Optical Disc