Effect of the Surface Temperature on Formation of Low-Temperature Phase in Magnetron-Sputtered Chromium Films

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概要

• 論文の詳細を見る

• The existence of a low-temperature (LT) chromium phase with the primitive cubic lattice in chromium films is questionable. We revealed that the main condition necessary for LT phase formation in magnetron sputtered Cr films is the deposition of the film from low-energy atomic flux, which is accomplished during deposition at a high working gas pressure. The films deposited from high-energy atomic flux at a low gas pressure crystallized in the ordinary bcc phase independently of the substrate temperature. This effect is explained by assuming the existence of a “hot” layer on the growth surface whose temperature can be noticeably higher than the substrate temperature.

• 2005-05-15

著者

• Han Jeon

  Center For Advanced Plasma Surface Technology Sungkyunkwan University

• Han Jeon

  Center for Advanced Plasma Surface Technology, SungKyunKwan University, 300 Chun-Chun-Dong, Jangan-gu, Suwon 440-746, Korea

• Shaginyan Leonid

  Center for Advanced Plasma Surface Technology, SungKyunKwan University, 300 Chun-Chun-Dong, Jangan-gu, Suwon 440-746, Korea

• Britun Nikolay

  Center for Advanced Plasma Surface Technology, SungKyunKwan University, 300 Chun-Chun-Dong, Jangan-gu, Suwon 440-746, Korea

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• Effect of the Surface Temperature on Formation of Low-Temperature Phase in Magnetron-Sputtered Chromium Films
• Surface Modification of Polyimide for Improving Adhesion Strength by Inductively Coupled Plasma
• LaF3/MgO Protective Layer in AC-Plasma Display Panels
• Structural Nonuniformity and Internal Stress in Chromium Films Deposited by Magnetron Sputtering

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