Controlling the Intrinsic Josephson Junction Number in a Bi2Sr2CaCu2O8+δ Mesa
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概要
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In fabricating Bi2Sr2CaCu2O8+δ intrinsic Josephson junctions in 4-terminal mesa structures, we modify the conventional fabrication process by markedly reducing the etching rates of argon ion milling. As a result, the junction number in a stack can be controlled quite satisfactorily as long as we carefully adjust those factors such as the etching time and the thickness of the evaporated layers. The error in the junction number is within $\pm 1$. By additional ion etching if necessary, we can controllably decrease the junction number to a rather small value, and even a single intrinsic Josephson junction can be produced.
- 2004-07-15
著者
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Wu Pei-heng
Research Institute Of Superconductor Electronics (rise) Department Of Electronic Science And Enginee
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Xu Wei-wei
Research Institute Of Superconductor Electronics (rise) Department Of Electronic Science And Enginee
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You Li-xing
Research Institute Of Superconductor Electronics (rise) Department Of Electronic Science And Enginee
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Ji Zheng-ming
Research Institute Of Superconductor Electronics (rise) Department Of Electronic Science And Enginee
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Kang Lin
Research Institute Of Superconductor Electronics (rise) Department Of Electronic Science And Enginee
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Kang Lin
Research Institute of Superconductor Electronics (RISE), Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
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You Li-Xing
Research Institute of Superconductor Electronics (RISE), Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
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Xu Wei-Wei
Research Institute of Superconductor Electronics (RISE), Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
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Ji Zheng-Ming
Research Institute of Superconductor Electronics (RISE), Department of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
関連論文
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