Critical Thickness for Nanostructure Self-Assembly During Stranski–Krastanow Growth

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概要

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• Stranski–Krastanow growth is discussed in the context of a simple classical nucleation model which emphasizes the important role of the wetting layer. The model predicts a rapid transition to a 3D island phase which chiefly depends on the interaction between atoms in the wetting layer and the substrate. A simple analytical expression for the critical thickness at which the transition occurs is derived.

• 2004-10-15

著者

• Lou Chaogang

  Department of Electronic Engineering, Southeast University, Nanjing 210018, P. R. China

• Jesson David

  School of Physics and Materials Engineering, Monash University, Victoria 3800, Australia

• Munt Timothy

  Department of Physics, Heriot-Watt University, Edinburgh EH14 4AS, United Kingdom

関連論文

• Critical Thickness for Nanostructure Self-Assembly During Stranski–Krastanow Growth

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