High-Resolution Blue-Laser Mastering Using an Inorganic Photoresist
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概要
- 論文の詳細を見る
An inexpensive and practical mastering technology was developed using a blue-laser optical system with a wavelength $\lambda$ of 405 nm and numerical aperture (NA) of 0.95 comprising an inorganic photoresist. The resist system showed a higher resolution for a successful 130 nm pit patterning than that obtained by an ordinary organic photoresist system. Based on this technology, a read only memory (ROM) disc with a recording capacity of 25.2 GB on a 120-mm-diameter surface was mastered at a high recording speed of 4.92 m/s. The disc showed a reasonable jitter value of 8.0% using a conventional equalizer, 4.6% using a limit equalizer and a push-pull signal using a conventional readout optical system of $\lambda=405$ nm and $\text{NA}=0.85$.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-02-15
著者
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Nakao Takashi
Optical Disc Development Division Av/it Development Group Sony Corporation
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OSATO Kiyoshi
Optical Disc Development Division, AV-IT Development Group. Sony Corporation
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Kai Shinichi
Optical Disk Development Division Av/it Development Group Sony Corporation
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Kouchiyama Akira
Storage Technology Laboratories Sony Corporation
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Nakagawa Kenzo
Optical Disk Development Division Av/it Development Group Sony Corporation
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Aratani Katsuhisa
Storage Technology Laboratories Sony Corporation
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Osato Kiyoshi
Optical Disc Development Division, AV/IT Development Group, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Takemoto Yoshihiro
Optical Disc Development Division, AV/IT Development Group, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Aratani Katsuhisa
Storage Technology Laboratories, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Nakagawa Kenzo
Optical Disc Development Division, AV/IT Development Group, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Kai Shinichi
Optical Disc Development Division, AV/IT Development Group, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
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Kouchiyama Akira
Storage Technology Laboratories, Sony Corporation, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
関連論文
- Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching
- Dual-Layer-Compatible Optical Head : Integration with a Liquid-Crystal Panel
- High-Resolution Blue-Laser Mastering Using and Inorganic Photoresist
- Dual-Layer-Compatible Optical Head: Integration with a Liquid-Crystal Panel
- High-Resolution Blue-Laser Mastering Using an Inorganic Photoresist
- Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching
- Dual-Layer-Compatible Optical Head: Integration with a Liquid-Crystal Panel