Optical Recording Using High Numerical-Aperture Microlens by Plasma Etching

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概要

論文の詳細を見る
We propose the use of a high numerical-aperture (NA) microlens formed by plasma etching for an optical recording application. It was found through optical recording experiments that a microlens formed by plasma etching is applicable to a tiny objective lens.
INSTITUTE OF PURE AND APPLIED PHYSICSの論文
2001-03-15

著者

Nakao Takashi
Giga Byte Laboratories Sony Corporation
ICHIMURA Isao
Giga Byte Laboratory, Sony Corporation Home Network Company
KISHIMA Koichiro
Giga Byte Laboratory, Sony Corporation Home Network Company
YAMAMOTO Kenji
Giga Byte Laboratory, Sony Corporation Home Network Company
IIDA Atsushi
Giga Byte Laboratory, Sony Corporation Home Network Company
OSATO Kiyoshi
Giga Byte Laboratory, Sony Corporation Home Network Company
KOUCHIYAMA Akira
Giga Byte Laboratorory, Sony Corporation Home Network Company
HASHIMOTO Gakuji
Giga Byte Laboratorory, Sony Corporation Home Network Company
Hashimoto Gakuji
Giga Byte Laboratory, Sony Corporation Home Network Company, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
Nakao Takashi
Giga Byte Laboratory, Sony Corporation Home Network Company, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
Ichimura Isao
Giga Byte Laboratory, Sony Corporation Home Network Company, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
Kouchiyama Akira
Giga Byte Laboratory, Sony Corporation Home Network Company, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
Kishima Koichiro
Giga Byte Laboratory, Sony Corporation Home Network Company, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan
Iida Atsushi
Giga Byte Laboratory, Sony Corporation Home Network Company, 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo 141-0001, Japan

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