Photofabrication of Kinoforms as Multilevel Relief Structures on Azobenzene-Containing Polymer Films

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概要

• 論文の詳細を見る

• We proposed a new method of fabricating kinoforms using azobenzene-containing polymers. The kinoform was designed as a phase pattern by applying the Gerchberg-Saxton algorithm. We converted the phase pattern into a gray-tone image, and used it as an amplitude mask. The azopolymer film was irradiated through the mask with a circularly polarized beam. In this way, the film was inscribed with a multilevel relief structure. By irradiating the film with a probe beam, we obtained the desired image in the diffracted beam. Thus, we successfully fabricated the kinoform on the azopolymer film by only one exposure. The method offers the advantage of the fabrication of multilevel relief structures with single-step processing, without the necessity for any subsequent processing steps.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2003-04-15

著者

• Yamada Hidenori

  New Business Center Fuji Xerox Company Ltd.

• Yasuda Shin

  Corporate Research Center Fuji Xerox Company Ltd.

• Minabe Jiro

  Corporate Research Center Fuji Xerox Company Ltd.

• Kawano Katsunori

  Corporate Research Center Fuji Xerox Company Ltd.

• Maruyama Tatsuya

  Corporate Research Center Fuji Xerox Company Ltd.

• Maruyama Tatsuya

  Corporate Research Center, Fuji Xerox Company, Ltd., 430 Sakai, Nakai-machi, Ashigarakami-gun, Kanagawa 259-0157, Japan

関連論文

• Photofabrication of Kinoforms as Multilevel Relief Structures on Azobenzene-Containing Polymer Films
• Polarization Encoding for Digital Holographic Storage
• Reversible Control of Thermally Enhanced Birefringence in Semicrystalline Azo Polymer Films with Polarized Light
• Digital Data Storage and Computing by a Vector Holographic Memory System
• Design of Dye Concentrations in Azobenzene-Containing Polymer films for Volume Holographic Storage
• Photofabrication of Kinoforms as Multilevel Relief Structures on Azobenzene-Containing Polymer Films

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