Photofabrication of Kinoforms as Multilevel Relief Structures on Azobenzene-Containing Polymer Films
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概要
- 論文の詳細を見る
We proposed a new method of fabricating kinoforms using azobenzene-containing polymers. The kinoform was designed as a phase pattern by applying the Gerchberg-Saxton algorithm. We converted the phase pattern into a gray-tone image, and used it as an amplitude mask. The azopolymer film was irradiated through the mask with a circularly polarized beam. In this way, the film was inscribed with a multilevel relief structure. By irradiating the film with a probe beam, we obtained the desired image in the diffracted beam. Thus, we successfully fabricated the kinoform on the azopolymer film by only one exposure. The method offers the advantage of the fabrication of multilevel relief structures with single-step processing, without the necessity for any subsequent processing steps.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-04-15
著者
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Yamada Hidenori
New Business Center Fuji Xerox Company Ltd.
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Yasuda Shin
Corporate Research Center Fuji Xerox Company Ltd.
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Minabe Jiro
Corporate Research Center Fuji Xerox Company Ltd.
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Kawano Katsunori
Corporate Research Center Fuji Xerox Company Ltd.
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Maruyama Tatsuya
Corporate Research Center Fuji Xerox Company Ltd.
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Maruyama Tatsuya
Corporate Research Center, Fuji Xerox Company, Ltd., 430 Sakai, Nakai-machi, Ashigarakami-gun, Kanagawa 259-0157, Japan
関連論文
- Photofabrication of Kinoforms as Multilevel Relief Structures on Azobenzene-Containing Polymer Films
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- Photofabrication of Kinoforms as Multilevel Relief Structures on Azobenzene-Containing Polymer Films