Ion Implantation Effects of Microcrystalline and Nanocrystalline Diamond Thin Films
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概要
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Microcrystalline and nanocrystalline diamond thin films deposited on Si substrates by microwave plasma chemical vapor deposition are bombarded by 40 keV B<SUP>+</SUP> ions. Raman scattering studies of the ion implanted diamond films reveal the structural modification irrespective of the nature of the crystalline quality. X-ray diffraction results indicate the possibility of formation of borocarbide phase on ion irradiation. Ion beam current dependence and post ion implantation annealing studies on the micro and nano-crystalline thin films are also presented.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
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