Characterization of Microbridges Generated on Negative Resist Patterns.
スポンサーリンク
概要
- 論文の詳細を見る
We analyze the mechanism of microbridge formation on chemically amplified negative resist patterns through direct observation of progressive development in alkali-developers. The microbridge formation was attributed to contact occurring between adjacent resist patterns due to swelling of the resist. These swollen resist patterns contracted upon immersion in deionized water; however, bridge structures remained as microbridges between these patterns. The swelling of the resist films occurred more easily at defocus positions than at a focus center, and the microbridges localized near the top of the pattern at defocus positions and delocalized at a focus center. An optical simulation suggested that both the crosslinking density and its distribution determine the number and position of the microbridges. A scaling law governing microbridge formation is observed as a function of focus position and exposure dose.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
- Electron Channelling Effect in an Al–Fe–Cu Quasicrystal
- Construction and Performance of a Large-Aperture Wire-Chamber Spectrometer for Pion Scattering Experiments at KEK
- Effect of Plasma Injection on Cold Wall Type MHD Generator
- Development of Scanning μ-RHEED Microscopy for Imaging Polycrystal Grain Structure in LSI
- Boundary Layer Cooling Effect on Semi-Hot Wall Type MHD Channel