Fabrication of Epitaxial Diamond Thin Film on Iridium.
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概要
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We have successfully grown smooth diamond thin films epitaxially on (001) iridium surfaces through a direct-current plasma chemical vapor deposition process with two steps: ion irradiation pretreatment and diamond growth. The epitaxial areas of diamond thin films with a mean thickness of about 1.5 µ m seem to act as optical mirrors. The average roughness (Ra) of the thin film, as measured by atomic force microscopy, is about 1 nm. Confocal Raman spectroscopy was used to investigate the depth profile of the thin film. Raman bands due to nondiamond carbon components were nominal at the diamond/iridium interface or at other depths.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
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