In Situ Surface Characterization of SrTiO3 (100) Substrates for Well-defined SrTiO3 and YBa2Cu3O7-x Thin Film Growth.
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The topmost atomic layer of SrTiO<SUB>3</SUB> (STO) substrates was investigated using in situ low-energy ion scattering spectroscopy (LEISS) for ultra-thin YBa<SUB>2</SUB>Cu<SUB>3</SUB>O<SUB>7- x</SUB> (YBCO) film growth. The topmost layer of a STO substrate after mechanochemical polishing consisted of SrO and TiO<SUB>2</SUB> planes. The topmost layer was dominantly stabilized with a TiO<SUB>2</SUB> plane after the STO substrate was treated with a pH-controlled NH<SUB>4</SUB>F-HF(BHF) solution. It was confirmed that the topmost layer of STO thin films deposited on STO substrates was affected by the surface structure of the STO substrates. Furthermore, the dependence of T<SUB> c</SUB> of heteroepitaxial YBCO ultra-thin films on thickness was better for BHF-treated STO substrates than for other substrates.
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公益社団法人 応用物理学会 | 論文
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