Evaluation of a Solid State Detector for X-Ray Lithography Dosimetry.
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概要
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Dosimetry of the X-ray radiation delivered to the mask-wafer plane of a stepper is essential for the development of a controlled X-ray lithography process. A wafer plane detector using a silicon photo-diode has been designed and evaluated for X-ray lithography applications. This detector was designed to provide real time measurements of beam fluence, delivered dose and beam uniformity. The detector has been evaluated on two CXrL beamlines, one with a scanning mirror and the other a beamline used in conjunction with a Karl Suss XRS 200 stepper that scans mask and wafer (and wafer plane monitor) vertically through the beam for exposures.
- 公益社団法人 応用物理学会の論文
公益社団法人 応用物理学会 | 論文
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