光照射フェライトメッキ法によるＦｅ３Ｏ４膜の作製

概要

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Polycrystalline Fe3O4 films were plated on glass substrates in an aqueous solution. By irradiating the substrate surface with an Xe-lamp at ∼450 W/cm2 power, the deposition rate of Fe3O4 film was increased by a factor of ∼10 (from ∼30 nm/min to ∼320 nm/min). With light exposures as short as 4 min we obtained ferrite films of ∼2μm thickness. We believe that the effect of the light is to raise the temperature. X-Ray analysis revealed that the films were polycrystalline spine1 with no preferred crystal orientation, scattering due to impurity phase being not observed.
社団法人日本磁気学会の論文