イオンアシスト蒸着Ｆｅ‐Ｎ膜の構造と磁気異方性

概要

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Change of the structure and magnetic properties of Fe-N films prepared by ion assisted vapor deposition was examined with varying ion current density and substrate temperature. The structure was characterized by X-ray diffraction techniques and the magnetic anisotropy was evaluated by torque curve measurement. When both the ion current density and the substrate temperature are low, uniaxial anisotropy is induced by ion bombardment. Origin of the uniaxial anisotropy is not known. With an increase in ion current density and substrate temperature, cube textures develop and a four-fold symmetrical anisotropy appears. As the directions of closest packed atoms in the textures are coincident with the direction of ion incidence, it is thought that the dependence of sputtering yield on grain orientation causes the texture development. Results of experiments using other ion species (Ar, Ne) are also shown.
社団法人日本磁気学会の論文