ＥＣＲプラズマによる窒化鉄薄膜の作製と磁気特性

概要

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The formation of iron-nitride films by ECR nitrogen plasma was studied in order to find a clue on film growth kinetics under highly activated plasma. From the measurements of optical emission spectroscopy, it was found that high density N2* radicals tended to the nitriding of iron, while N2+ ions hastened the crystal growth of films. A γ′-Fe4N crystalline film with a (111) plane could be obtained at a temperature lower than 200°C. The suturation magnetization (Ms) and the coercive force (Hc) for the film were 170 emu/g and 200 Oe, respectively, which were somewhat lower than those of its bulk crystal.
社団法人日本磁気学会の論文