Ablative Degradation of Copolymers of Methyl Methacrylate with Acrylic Acid Esters Using 185nm Light.
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概要
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Copolymers of methyl methacrylate (MMA) and acrylic acid esters were prepared and the photoinduced degradation of the polymers was studied in vacuo using 185nm light. On irradiation at room temperature, the effective main-chain scission of poly (methyl methacrylate) (PMMA) was observed. On irradiation at 130°C, however, the ablative degradation of PMMA was observed. The rate of ablation of the copolymer of MMA and acrylic acid ester was lower compared to PMMA and the rate was dependent on the content of acrylic acid ester units and the structure of alkyl groups of acrylic acid ester units.
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