Information Technology Industry and Laser Technology. Multi-Probe Aimed for High Density Data Storage.
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概要
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Near-field aperture probes with high optical transmittance efficiency (transmittance) for optical recording and multi-probes with a metal wire as a heater for thermal recording are batch-fabricated by silicon micromachining. The aperture with diameter sizes from 10 to 500 nm at the apex of a SiO<SUB>2</SUB> tip on a Si cantilever is fabricated using a "Low temperature Oxidation & Selective Etching" technique. The SiO<SUB>2</SUB> tip is formed bynonuniform Si wet oxidation at 950°C. The aperture is created at the apex of SiO<SUB>2</SUB> tip by selective etching of SiO<SUB>2</SUB> in a buffered-HF. The aperture shows a high optical transmittance because the SiO<SUB>2</SUB> tip has a large opening angle. This fabrication technique is extended to fabricate a metal nanowire at the apex of the SiO<SUB>2</SUB> tip by embedding a metal into the aperture. By flowing a current into the metal wire, the tip can be heated. This probe array is fabricated, and the basic characteistics are evaluated.
- 社団法人 レーザー学会の論文
社団法人 レーザー学会 | 論文
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