Semiconductor Laser on Si Substrate Using Heteroepitaxial Growth Technique.
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概要
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Light emitting devices grown by heteroepitaxial growth technique such as GaN/Al<SUB>2</SUB>0<SUB>3</SUB>, ZnSe/GaAs and GaAs/Si have a serious problem of reliability because of their high dislocation density. For example, GaAs-based light emitting diode (LED) and laser grown on Si substrates suffer from rapid degradation because of a high dislocation density (> 10<SUP>6</SUP> cm<SUP>-2</SUP>) and a large residual thermal stress (-10<SUP>9</SUP> dyn/cm<SUP>2</SUP>), which are introduced by the -4% lattice mismatch and the -250 % difference in the thermal expansion coefficients between GaAs and Si. If the sizes of active regions in these devices are drastically reduced, the reliability can be remarkably improved due to low dislocation numbers. From this point of view, we demonstrated A1GaAs/GaAs vertical cavity surface emitting laser (VCSEL), quantum wire-like laser and LED with self-assembled GaAs dots active region on Si. This novel technique is very promising for the improvement of reliability of light emitting devices with high dislocation density grown by heteroepitaxy.
- 社団法人 レーザー学会の論文
社団法人 レーザー学会 | 論文
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