Diagnostics of gas-phase processes in laser induced chemical vapour deposition by laser spectroscopy. Experiments on radicals relevant to carbon film deposition.:Experiments on Radicals Relevant to Carbon Film Deposition
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概要
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A laser spectroscopic diagnostic system was developed to measure fundamental processes inthe gas-phase of laser-induced chemical vapour deposition. The system was used to detect theradicals relevant to carbon film deposition processes, such as CH, C<SUB>2</SUB>, CH<SUB>3</SUB> and H. Detailedmeasurements of temporal and spatial behavior of C<SUB>2</SUB> radical densities were performed. Measuredresults were used to determine the reaction and the diffusion coefficients of C<SUB>2</SUB> radical. The possibility of measuring the sticking coefficient on a substrate was also discussed.
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社団法人 レーザー学会 | 論文
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