An XPS Analysis of the Interfacial Interaction between Oxides and Epoxy Resin.
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概要
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We investigated the interfacial interactions between epoxy resin and metal-oxide substrates(MgO, Al<SUB>2</SUB>O<SUB>3</SUB>, SiO<SUB>2</SUB>) by means of X-ray photoelectron spectroscopy (XPS). Thin films were deposited on the substrates in order to measure the interface directly by XPS. The appropriate thickness of the epoxy resin film for the interfacial analysis is 2∼3.5nm. The angle-resolved XPS spectra showed that the epoxy molecules were oriented on the substrates. This suggests that an interfacial interaction exists between the epoxy resin and metal-oxide substrates. From the C-O peak due to epoxy radicals, it was found that the binding energy of epoxy resin film on MgO was 0.3eV lower than that of bulk epoxy resins. This energy shift of Cls spectra suggests an electron donation from MgO to epoxy resin.
- 公益社団法人 日本表面科学会の論文
公益社団法人 日本表面科学会 | 論文
- An XPS Analysis of the Interfacial Interaction between Oxides and Epoxy Resin.
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