Photochemical etching of copper thin films of circuit board in chlorine and trichloroethylene ambients with a KrF excimer laser.
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概要
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Photochemical etching of copper thin films of circuit boards in chlorine and trichloroethylene (TCE) ambients by line-focused krypton fluoride excimer laser irradiation are described. It isdemonstrated for the first time that trichloroethylene is successfully used as an etching agent. Theaspect ratio of trichloroethylene is improved by a factor of two compared with chlorine.
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社団法人 レーザー学会 | 論文
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