Microstructural Investigation of Modulated Structure in Electrolessly Deposited Co-P Films

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The depositing conditions were investigated for obtaining a modulated structure that appeared between an amorphous structure and a columnar structure in electroless Co-P alloy films. The microstructure of electroless Co-P films was found to be sensitively dependent on the variation of the deposition rate controlled by both the solution pH and the stirring strength. Uniform modulated structure Co-P film was formed in the limited deposition rate range. Cross-sectional transmission electron microscopy clarified that the modulated structure Co-P film consists of a periodic array of granules less than 100 nm separated by amorphous channels enriched with phosphorous. The modulated structure Co-P film was comprised of hard and soft magnetic components.
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