Microstructure Analysis and Optimization of Sputter-Deposited Zinc Oxide Thin Films Used in Low-Emissivity Coatings for Energy Efficient Windows

概要

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ZnO thin films were deposited with changing oxygen gas pressure and their microstructures were investigated by the glancing incident X-ray reflectivity measurement. It was found that the ZnO thin films exhibited higher packing density and smoother surface morphology, when they were deposited in lower oxygen gas pressure. These microstructure improvements of ZnO thin films with decreasing in oxygen gas pressure should come from the increase in the kinetic energy of sputtered Zn atoms and gas particles such as oxygen negative ions recoiled from the sputtering target surface. Furthermore, the double-layered low-emissivity coatings consisting of glass/ZnO/Ag were also prepared and the correlation between the microstructure of ZnO thin films and the electrical property of the Ag thin films was clarified. The Ag thin films exhibited low electrical resistivity when the ZnO thin films deposited in low oxygen gas pressure were used. It can be considered that this improvement in the Ag resistivity is attribute to the high packing density and smooth surface of the ZnO thin film.
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