Thin Films of the Insulating (001) CaCuO2 Infinite-Layer with Low Roughness and Highly Uniform Morphology
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概要
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Thin films of the infinite layer insulator CaCuO2 with (001) orientation were prepared by MOCVD at different growth temperatures (650-800°C). At lower temperatures, growth is through a 3D mechanism, while at temperatures above 770°C it changes into a 2D one. Epitaxial films composed of uniform square-shape grains showing high crystal quality and low roughness were obtained for a optimum growth temperature of 790°C. Mean square roughness (RMS) was around 1.5nm. This value is about half of the best values determined for the films of Ca0.5Sr0.5CuO2 from the Ca1-xSrxCuO2 and Ca1-xBaxCuO2 films series (x=0-1) reported earlier. The result suggests that these films are suitable for device fabrication or integration. Some details of the anisotropic growth are discussed.
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一般社団法人 日本MRS | 論文
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