開放系でのプラズマプロセス実現に向けた雰囲気制御技術開発

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概要

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• Local ambient gas control technologies for atmospheric pressure plasma processes using a new curtain gas structure have been developed. The local ambient gas control was studied theoretically and experimentally. Safe and clean process conditions (reactive gas leakage below 0.1 vol.% and air contamination below 10ppm) were achieved in open air. H2 plasma was generated with H2 concentrations above the explosive limit (4.1% in air) successfully. As an application, Cu reduction and SiO2 etching were demonstrated. These results indicate that our local ambient gas control technologies have adequate potential for atmospheric pressure plasma processes.

著者

• 内藤 皓貴

  Macro BEANS Center, BEANS Laboratory

• 紺野 伸顕

  Macro BEANS Center, BEANS Laboratory

• 徳永 隆志

  Macro BEANS Center, BEANS Laboratory

• 伊藤 寿浩

  Macro BEANS Center, BEANS Laboratory

関連論文

• 開放系でのプラズマプロセス実現に向けた雰囲気制御技術開発

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