Thermal desorption of hydrogen adsorbed on copper surface.
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概要
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The thermal desorption of hydrogen adsorbed on a clean surface of polycrystalline copper foil was studied under ultra high vacuum conditions. The presence of chemisorbed hydrogen in a dissociated state was verified in a temperature range between 193 and 573 K. During the desorption process, the adsorbed hydrogen atoms recombined into molecules; this follows second order kinetics. The activation energy for desorption was 68.6±8.0 kJ mol<SUP>−1</SUP> and remained nearly constant in the range of surface coverage up to 1.6×10<SUP>14</SUP> atom cm<SUP>−2</SUP>. The isotope effect on the desorption of deuterium was found to be straightforward. These findings showed a good agreement with the results obtained from the analysis of H<SUB>2</SUB>–D<SUB>2</SUB> equilibration on copper powder catalyst. In addition, the necessary conditions to obtain the exact desorption spectra were inspected with the aid of computer simulation.
- 公益社団法人 日本化学会の論文
著者
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Yasumori Iwao
Department Of Applied Chemistry Faculty Of Engineering Kanagawa University
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Kojima Isao
Department of Applied Chemistry, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
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Kiyomiya Makoto
Department of Chemistry, Tokyo Institute of Technology
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Kojima Isao
Department of Chemistry, Tokyo Institute of Technology
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