超超純水への挑戦 : イオン吸着膜
スポンサーリンク
概要
- 論文の詳細を見る
In the process of semiconductors, heavy metal ions and TMA (Trimethyl amin) cause defects of the products. So the reduction of these cations in ultra-pure water (UPW) is desired. We developed Ion Adsorption Membrane (MICROZA SKT-352F), which can reduce the heavy metals in UPW less than 0.1ppt.
- 日本膜学会の論文
- 2003-03-01