エアロゾル化ガスデポジション法によるジルコニア膜の形成(荷電粒子の噴射による)

スポンサーリンク

概要

• 論文の詳細を見る

• The aerosol gas deposition method (AGD) is a low temperature method. No heating procedure exists in the AGD process during the formation of the AGD films. We can form even ceramic films by using AGD method. However, the mechanism of synthesizing ceramic film has not been made clear until now. This paper is the first trial to clarify the mechanism by using two kinds of zirconia powder. The experimental results indicated that in wet type zirconia powder the film could be formed in the limited conditions of diameter and the specific surface area of powders although in dry-milled zirconia powder all powders used could form the films. At the same experiments we observed the high temperature phase of zirconia in the film and a light emission phenomenon at the deposition site during AGD process. In this paper, we discuss the formation mechanism of the AGD film at the ambient temperature correlating with the film formation condition, the appearance of the high temperature phase and the light emission.

著者

• 渕田 英嗣

  (有)渕田ナノ技研

• 渕田 英嗣

  （有）渕田ナノ技研

• 時崎 栄治

  （有）渕田ナノ技研

• 小澤 英一

  （有）渕田ナノ技研

• 目 義雄

  （独）物質・材料研究機構

関連論文

• エアロゾル化ガスデポジション法によるジルコニア膜の形成(荷電粒子の噴射による)
• エアロゾル化ガスデポジション法によるジルコニア膜の形成 : 荷電粒子の噴射による

スポンサーリンク