A Few Remarks on Spectrochemical Analysis of Impurity Elements in Metallic Tantalum

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For spectrochemical analysis of eleven elements that are contained in metallic tantalum as impurities with the specific purpose of revising the determinable lower limit of the most concerned element Nb, use of line Nb 4058.9, the most intense one of Nb lines, is made. Standard samples are prepared by the method of oxide mixing and dilution and metallic samples are converted to oxide form.The oxides are mixed with one-half quantity of carbon powder as buffer and arced intermittently (a c.200 V, 10 A, 30 sec.) with graphite elecrodes.For the range of 2300-4700 A, the first order of Ebert type spectrograph is used, and two kinds of emulsion, Kodak SA-1 plates and Fuji process plates, are used, the former for the shorter, the latter for the longer parts of the range. The results are compared with those obtained by the conventional method of using the second order.For Nb, Al and Ca, the new method gives better results than the conventional method.For Cr, Cu, Fe, Mg, Mn, Ni and Ti, no significant difference in merit is observed between the two, methods.For Si, the conventional method is preferable. The determinable lower limits obtained by the proposed method are: 0.0001% for Al, Ca, Cu and Mg, 0.0001% for Cr, Fe, Mn, Ni, Si and Ti, 0.005% for Nb. Four mercury lines are used for obtaining the intensity relation between the 1st and 2nd orders of the spectrograph grating.
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