プラズマCVD法によるTEOS分解シリコン酸化膜
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概要
- 論文の詳細を見る
Silicon oxide films used as interlayer dielectrics in silicon integrated circuits were fabricated, Using the plasma-enhanced decomposition of TEOS (tetraethoxysilane).
- 社団法人 化学工学会の論文
Silicon oxide films used as interlayer dielectrics in silicon integrated circuits were fabricated, Using the plasma-enhanced decomposition of TEOS (tetraethoxysilane).