非晶質As-Se-Ge薄膜におけるレリ-フ型回折格子の解析
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概要
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A semiconductor As<SUB>10.0</SUB>-Se<SUB>67.5</SUB>-Ge<SUB>22.5</SUB> amorphous film is one of the photosensitive materials from which relief patterns can be obtained. Holographic characteristics of the amorphous film are different from that of a photoresist film. The differences have been proved by considering light absorption and side etching properties.<BR>Moreover, we pointed out that "back-side" exposure could improve both diffraction efficiency and ratio of signal to noise.
- 一般社団法人 日本真空学会の論文