酸素イオン照射時の金属のスパッタおよび二次イオン収率
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概要
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The yield of sputtering and secondary ion emission of metals under oxygen ion bombardment were simulta-neously measured for multilayer targets with a known layer thickness. The sputtering yield of each layered metal was determined by the time to sputter away the thin film.<BR>The experimental results revealed that the sputtering yields of metals were primarily explained by Sigmunds theory and a linear relationship was found between the ionization potential and modified degree of ionization which can be expressed by the ionization potential and the secondary O<SUB>2</SUB><SUP>+</SUP>current.
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