クエンチ法によるNbN薄膜の作製

概要

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Niobium nitride films with high superconducting transition temperature Tc form the NaCl structure which is a stable phase only at high temperatures. Many works were reported on a method of stabilizing this metastable NaCl phase at low temperatures by doping such impurities as carbon and oxygen. For keeping substantially good nature of NbN with an estimated T of 29K, other methods free from impurities are desirable. Here quenchtechnique is tried as a first approach. NbN films are sputtered onto sapphire substrates by magnetron sputtering and are quenched just after sputtering by thermal conduction from liq.N2-cooled anode. The relation between cooling rate and Tc, the transition width Δ Tc and the crystal structure are examined. Quenching just after deposition is useful in preparing NbN films with high Tc and narrow Δ Tc
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