スパッタPd-Ag合金薄膜の構造・組成に及ぼす熱処理の影響

概要

論文の詳細を見る
Pd-Ag alloy thin films deposited on silicon substrates by means of rf magnetron sputtering under various deposition parameters, such as rf power, Ar gas pressure and target configuration, were studied using FESEM, XPS and XRD. The surface morphology, chemical composition, chemical state and crystal structure of the films was influenced by various deposition parameters. Two different heat treatments were carried out on the films. In the oxidation atmosphere, the films were almost oxidized, while in the reduction atmosphere, Ag content and lattice constant of the films were increased.
日本真空協会の論文
2003-03-20