蛍光X線によるAl膜厚測定
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概要
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The thickness of Al thin films on 1000Å SiO<SUB>2</SUB> was estimated by using X-ray fluorescence (XRF). It was found thatÅ when the films were less than 1000Å thick, the number of Al XRF counts was directly proportional to the Al thickness. Therefore, Al thickness is given by <I>t</I>=<I>a</I>(<I>If</I>-<I>Bg</I>) within an error of 3.0%, where <I>a</I> and <I>Bg</I> are constant and background noise, and <I>If</I> is the Al XRF count. In the Al film thicknes range of 2000Å to 1.2 μm, XRF counts vs. Al thickness becomes nonlinear due to Al self-absorption. The Al thickness was given by <I>t</I>=-<I>a</I>·ln(1-(<I>If</I>-<I>Bg</I>/<I>Imax</I>)), where <I>Imax</I> is maximum value measured by Al XRF. The maximum relative error was 1.6%. However, for the Al film thickness range of 1000Å to 2000Å, the relative error was 9.7%.
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