エキシマレーザCVD法によるW/C多層膜の作製
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概要
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We have studied the characteristics of tungsten and carbon thin films, and tungsten-carbon multilayers prepared by ArF excimer-laser-induced chemical vapor deposition using tungsten hexafluoride and benzene gases. The carbon films deposited at substrate temperatures of 100-300°C are amorphous hydrogenated carbon films with very smooth surfaces. The surface morphology of the tungsten film depends on substrate temperature; at substrate temperatures of 100-200°C, amorphous tungsten films with very smooth surfaces have been obtained. In small-angle X-ray scattering measurement of a W/C multilayer deposited at a substrate temperature of 200°C, a first order of the multilayer reflection was clearly observed. Furthermore, Auger electron spectroscopy showed that W and C layers in the multilayer were periodically deposited.
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