CVD法によるサファイア基板上へのルチル膜の作製と光学的性質 (光機能材料<特集>)
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概要
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Rutile films were prepared on sapphire (1102) substrates by chemical vapor deposition using titanium tetraisopropoxide {Ti[OCH(CH<SUB>3</SUB>)<SUB>2</SUB>]<SUB>4</SUB>} as a precursor. The Elms showed preferred orientation of (101) parallel to the substrate plane. The epitaxial relationship between the film and the substrate was found by X-ray pole figure analysis. Refractive index nealy equal to that of the single crystal of rutile was measrued for the epitaxial film prepared at 800°C.
- 社団法人 粉体粉末冶金協会の論文